| Titre : |
Optical scattering [3rd ed.] : measurement and analysis |
| Type de document : |
texte imprimé |
| Auteurs : |
John C. Stover, Auteur |
| Mention d'édition : |
Third edition |
| Editeur : |
Bellingham, Wash. : SPIE Press |
| Année de publication : |
cop. 2012 |
| Importance : |
1 vol. (XXIV-307 p.) |
| Présentation : |
ill, couv ill. en coul. |
| Format : |
26 cm |
| ISBN/ISSN/EAN : |
978-1-62841-840-8 |
| Note générale : |
Soft cover printing 2015.- PPN 237370344 |
| Langues : |
Anglais (eng) |
| Tags : |
Lumière -- Diffusion Light -- Scattering |
| Index. décimale : |
535.43 Diffusion |
| Résumé : |
The first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light. (SPIE press) |
| Note de contenu : |
Sommaire (abrégé) : Preface to the 1st ed. (xiii) - Preface to the 2nd ed. (xv) - Preface to the 3rd ed. (xix) - List of Acronyms (xxiii) - Chap. 1 Quantifying light scatter (p.1) - Chap. 2 Quantifying surface roughness (p.23) - Chap.3 Scatter calculations and diffraction theory (p.47)- Chap. 4 Using Rayleigh-Rice to calculate Smooth-Surface statistics from the BRDF (p.69) - Chap. 5 Polarization of scattered light (p.91) - Chap.6 Scattering models for discrete surface features (p.109) - Chap. 7 Instrumentation and measurement issues (p.115) - Chap. 8 Predicting scatter from roughness (p.157) - Chap. 9 Detection of discrete defects (p.185) - Chap. 10 Appearance and scattered light (p.201) - Chap.11 Industrial applications (p.209) - Chap.12 Published scatter standards (p.229) - Chap.13 Scatter specifications (p.239) - Appendix A. Review of electromagnetic wave propagation (p.257) - Appendix B. Kirchhoff diffraction from sinusoidal gratings (p.265) - Appendix C. BSDF data (p.273)- Appendix D. Units (p.281) - References (p.283) - Works consulted (p.297) - Index (p.303) |
Optical scattering [3rd ed.] : measurement and analysis [texte imprimé] / John C. Stover, Auteur . - Third edition . - Bellingham, Wash. : SPIE Press, cop. 2012 . - 1 vol. (XXIV-307 p.) : ill, couv ill. en coul. ; 26 cm. ISBN : 978-1-62841-840-8 Soft cover printing 2015.- PPN 237370344 Langues : Anglais ( eng)
| Tags : |
Lumière -- Diffusion Light -- Scattering |
| Index. décimale : |
535.43 Diffusion |
| Résumé : |
The first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light. (SPIE press) |
| Note de contenu : |
Sommaire (abrégé) : Preface to the 1st ed. (xiii) - Preface to the 2nd ed. (xv) - Preface to the 3rd ed. (xix) - List of Acronyms (xxiii) - Chap. 1 Quantifying light scatter (p.1) - Chap. 2 Quantifying surface roughness (p.23) - Chap.3 Scatter calculations and diffraction theory (p.47)- Chap. 4 Using Rayleigh-Rice to calculate Smooth-Surface statistics from the BRDF (p.69) - Chap. 5 Polarization of scattered light (p.91) - Chap.6 Scattering models for discrete surface features (p.109) - Chap. 7 Instrumentation and measurement issues (p.115) - Chap. 8 Predicting scatter from roughness (p.157) - Chap. 9 Detection of discrete defects (p.185) - Chap. 10 Appearance and scattered light (p.201) - Chap.11 Industrial applications (p.209) - Chap.12 Published scatter standards (p.229) - Chap.13 Scatter specifications (p.239) - Appendix A. Review of electromagnetic wave propagation (p.257) - Appendix B. Kirchhoff diffraction from sinusoidal gratings (p.265) - Appendix C. BSDF data (p.273)- Appendix D. Units (p.281) - References (p.283) - Works consulted (p.297) - Index (p.303) |
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